Location History:
- Hsinchu County, TW (2015)
- Kaohsiung, TW (2015 - 2017)
Company Filing History:
Years Active: 2015-2017
Title: Minhuei Wang: Innovator in Photopatternable Materials
Introduction
Minhuei Wang is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of polymeric materials, particularly in the development of photopatternable materials that are essential for various electronic devices.
Latest Patents
Wang holds 3 patents, with his latest innovations focusing on photopatternable materials and related electronic devices and methods. These polymeric materials can be patterned with relatively low photo-exposure energies. They are thermally stable, mechanically robust, resist water penetration, and show good adhesion to metal oxides, metals, metal alloys, as well as organic materials. Additionally, these materials can be solution-processed, such as by spin-coating, and exhibit good chemical resistance in their cured form.
Career Highlights
Throughout his career, Minhuei Wang has worked with reputable companies, including Polyera Corporation and Flexterra, Inc. His work has significantly advanced the understanding and application of photopatternable materials in the electronics industry.
Collaborations
Wang has collaborated with esteemed colleagues, including Antonio Facchetti and Shaofeng Lu, contributing to the innovative research in his field.
Conclusion
Minhuei Wang's contributions to the development of photopatternable materials have positioned him as a key figure in the electronics sector. His innovative work continues to influence the advancement of technology in this area.