This inventor holds 4 USPTO granted patents and 2 published patent applications. Top assignee: Nanjing University. Active years: 2014-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014-2026
Title: Innovations of Minghui Lu in Nanoimprint Technology
Introduction
Minghui Lu is a prominent inventor based in Nanjing, China. He has made significant contributions to the field of nanoimprint technology, particularly in the development of flexible molds for fabricating ultra-fine structures. With a total of 4 patents to his name, his work is paving the way for advancements in various applications.
Latest Patents
One of Minghui Lu's latest patents is titled "Flexible nanoimprint mold, method for fabricating the same, and mold usage on planar and curved substrate." This invention provides a flexible nanoimprint mold capable of fabricating sub-15 nm ultra-fine structures on both planar and curved substrates. The mold consists of a top ultra-thin rigid layer featuring imprint patterning and a bottom thick flexible layer made of polymer elastomer. These two layers are integrated through chemical bonding, allowing the top layer to achieve a sub-15 nm resolution while the bottom layer ensures conformal contact with various substrate surfaces. The methods for fabricating this innovative mold are also disclosed in the patent.
Career Highlights
Minghui Lu is affiliated with Nanjing University, where he continues to engage in cutting-edge research and development. His work has garnered attention for its potential applications in nanotechnology and materials science.
Collaborations
Minghui Lu collaborates with notable colleagues, including Yanfeng Chen and Haixiong Ge, who contribute to his research endeavors and innovations.
Conclusion
Minghui Lu's contributions to nanoimprint technology exemplify the innovative spirit of modern inventors. His work not only advances the field but also opens new avenues for future research and applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
