The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2017

Filed:

Apr. 05, 2016
Applicant:

Nanjing University, Nanjing, CN;

Inventors:

Yanfeng Chen, Nanjing, CN;

Haixiong Ge, Nanjing, CN;

Zhiwei Li, Nanjing, CN;

Changsheng Yuan, Nanjing, CN;

Minghui Lu, Nanjing, CN;

Assignee:

NANJING UNIVERSITY, Nanjing, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 33/40 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); G03F 7/00 (2006.01); B05D 1/00 (2006.01); B29C 59/02 (2006.01); G03F 1/76 (2012.01); G03F 7/20 (2006.01); B29K 83/00 (2006.01);
U.S. Cl.
CPC ...
B29C 33/405 (2013.01); B05D 1/005 (2013.01); B29C 33/40 (2013.01); B29C 59/022 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); G03F 1/76 (2013.01); G03F 7/0002 (2013.01); G03F 7/20 (2013.01); B29K 2083/00 (2013.01); B29K 2883/00 (2013.01); Y10T 156/1023 (2015.01);
Abstract

The present invention provides a flexible nanoimprint mold which can fabricate sub-15 nm ultra fine structures on either planar or curved substrates. The mold comprises a top ultra-thin rigid layer of imprint patterning features and a bottom thick flexible layer of polymer elastomer. The two distinct layers are preferably integrated via chemically bonding. The top layer of the mold enables a sub-15 nm resolution of pattern fabrication and the bottom layer affords a conformal contact to planar or curved surface of substrates. The methods for fabricating the same are disclosed.


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