Company Filing History:
Years Active: 2012-2017
Title: Haixiong Ge: Innovator in Nanoimprint Technology
Introduction
Haixiong Ge is a prominent inventor based in Nanjing, China. He has made significant contributions to the field of nanoimprint technology, particularly in the development of flexible molds for fabricating ultra-fine structures. With a total of 4 patents to his name, Ge continues to push the boundaries of innovation in his field.
Latest Patents
One of Haixiong Ge's latest patents is titled "Flexible nanoimprint mold, method for fabricating the same, and mold usage on planar and curved substrate." This invention provides a flexible nanoimprint mold capable of fabricating sub-15 nm ultra-fine structures on both planar and curved substrates. The mold consists of a top ultra-thin rigid layer featuring imprint patterning and a bottom thick flexible layer made of polymer elastomer. These two layers are integrated through chemical bonding, allowing the top layer to achieve a sub-15 nm resolution in pattern fabrication while the bottom layer ensures conformal contact with various substrate surfaces. The methods for fabricating this innovative mold are also disclosed in the patent.
Career Highlights
Haixiong Ge is affiliated with Nanjing University, where he conducts research and development in the field of nanoimprint technology. His work has garnered attention for its potential applications in various industries, including electronics and materials science. Ge's innovative approach to mold design and fabrication has positioned him as a key figure in advancing nanoimprint technology.
Collaborations
Throughout his career, Haixiong Ge has collaborated with notable colleagues, including Yanfeng Chen and Zhiwei Li. These collaborations have further enriched his research and contributed to the development of cutting-edge technologies in the field.
Conclusion
Haixiong Ge is a distinguished inventor whose work in flexible nanoimprint molds is paving the way for advancements in the fabrication of ultra-fine structures. His contributions to the field are significant and continue to inspire innovation in various applications.