Fengshan, Taiwan

Ming-Yi Wang

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ming-Yi Wang. Retrieved from https://idiyas.com/inventor/ming-yi-wang-rg9z6nla

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2008

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1 patent (USPTO):Explore Patents

Title: The Innovations of Ming-Yi Wang

Introduction

Ming-Yi Wang is a notable inventor based in Fengshau, Taiwan. He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent. His work focuses on improving the efficiency and effectiveness of etching processes used in the manufacturing of semiconductor devices.

Latest Patents

Ming-Yi Wang holds a patent for a "Convex insert ring for etch chamber." This invention presents a new and improved insert ring designed for a wafer support inside a processing chamber, specifically for the dry etching of semiconductor wafer substrates. The insert ring features a generally convex inner surface that faces the wafer support, creating a gap or berline wall between the insert ring and the wafer support. In one embodiment, the convex inner surface is convexly-tapered, while in another, it is convexly-curved. This design effectively prevents or significantly reduces the accumulation of polymer material on the inner surface of the insert ring during the etching of multiple successive substrates. As a result, polymer peeling is minimized, leading to prolonged operational intervals for the processing chamber between maintenance or cleaning.

Career Highlights

Ming-Yi Wang is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work at this prestigious company has allowed him to contribute to advancements in semiconductor technology and processing.

Collaborations

Ming-Yi Wang has collaborated with notable colleagues, including Jeng-Yen Tsai and Jeng-Chiang Chuang. These collaborations have fostered innovation and development in their respective fields.

Conclusion

Ming-Yi Wang's contributions to semiconductor processing through his innovative patent demonstrate his commitment to advancing technology in this critical industry. His work not only enhances the efficiency of etching processes but also sets a standard for future innovations in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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