Company Filing History:
Years Active: 1995-1998
Title: The Innovations of Ming-Tzung Yang
Introduction
Ming-Tzung Yang is a prominent inventor based in Hsin Chu, Taiwan. He has made significant contributions to the field of technology, particularly in the area of ion deposition processes. With a total of 5 patents to his name, Yang's work has had a considerable impact on the industry.
Latest Patents
One of Yang's latest patents is a process for evenly depositing ions using a tilting and rotating platform. This innovative method allows for the deposition of a layer of uniform thickness on uneven surfaces of a substrate. The process can utilize plasma or chemical vapor deposition (CVD) techniques. By tilting and rotating the movable platform during deposition, the ions or chemical vapor can reach both horizontal surfaces and vertical sidewalls at similar incident angles. This results in an evenly deposited layer with uniform thickness, proper coverage, and effective planarization.
Career Highlights
Ming-Tzung Yang is currently employed at United Microelectronics Corporation, where he continues to develop and refine his innovative processes. His expertise in the field has positioned him as a valuable asset to the company and the industry at large.
Collaborations
Yang has collaborated with notable colleagues, including Hong-Tsz Pan and Shih-Chanh Chang. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Ming-Tzung Yang's contributions to the field of ion deposition processes exemplify the spirit of innovation. His work not only advances technology but also sets a standard for future developments in the industry.