This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2000.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2000
Title: The Innovations of Ming-Shu Yen
Introduction
Ming-Shu Yen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of advanced gate electrode structures for field-effect transistors (FETs). His innovative methods have the potential to enhance the performance and reliability of electronic devices.
Latest Patents
Ming-Shu Yen holds a patent for a method of making improved polysilicon FET gate electrodes. This method involves the use of composite sidewall spacers to enhance the structural integrity and performance of the gate electrodes. The process includes forming polysilicon gate electrodes on a substrate, followed by the deposition of a trapezoidal-shaped SiO₂ stress-release layer. A Si₃N₄ layer is then deposited and plasma etched back, utilizing the SiO₂ layer as an etch-endpoint-detect layer. This innovative approach protects the source and drain areas from plasma etch damage, which can lead to high leakage currents. The method ultimately results in more reliable contacts without degrading FET performance.
Career Highlights
Ming-Shu Yen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on improving the manufacturing processes and performance of semiconductor devices. His contributions have been instrumental in advancing the technology used in modern electronics.
Collaborations
Ming-Shu Yen has collaborated with several talented individuals in his field, including Fu-Ying Chiu and Chien-Hung Lin. These collaborations have fostered innovation and have led to the development of cutting-edge technologies in semiconductor manufacturing.
Conclusion
Ming-Shu Yen's innovative methods in semiconductor technology demonstrate his commitment to enhancing electronic device performance. His patent for improved polysilicon FET gate electrodes showcases his expertise and contributions to the field. His work continues to influence the future of semiconductor manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile