Company Filing History:
2 out of 9,152 
1 out of 32 
1 out of 980 
Years Active: 2008
Title: Innovations of Ming-Nan Hsiao
Introduction
Ming-Nan Hsiao is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of thin film technology, holding a total of 2 patents. His work focuses on innovative methods for fabricating active layer thin films and manufacturing thin film transistors (TFTs).
Latest Patents
One of his latest patents is a method of fabricating an active layer thin film by a metal-chalcogenide precursor solution. This method includes synthesizing a metal-chalcogenide precursor containing benzyl or a benzyl derivative, dissolving the precursor in a solvent to produce a precursor solution, and applying the precursor solution onto a substrate to form a film of the metal-chalcogenide after a curing process. This innovation replaces the existing method of fabricating an amorphous silicon active layer film by plasma enhanced chemical vapor deposition (PECVD).
Another notable patent involves methods for manufacturing thin film transistors that include selectively forming an active channel layer from a solution. This method can be applied to both inverted staggered and co-planar TFT structures. It emphasizes the use of metal oxides or II-VI compound semiconductors and a low-temperature CBD process to form the active channel layer. The invention offers advantages such as low deposition temperature, selective deposition, and low fabrication cost, making it suitable for flexible substrates.
Career Highlights
Ming-Nan Hsiao has worked with notable organizations such as the Industrial Technology Research Institute and the Taiwan TFT LCD Association. His experience in these institutions has contributed to his expertise in thin film technologies and semiconductor manufacturing.
Collaborations
He has collaborated with esteemed colleagues, including Hua-Chi Cheng and Chun-Yao Ou, further enhancing the impact of his innovations in the field.
Conclusion
Ming-Nan Hsiao's contributions to thin film technology and his innovative patents demonstrate his significant role as an inventor. His work continues to influence advancements in the manufacturing of electronic components.