Ming-Jun Wang

Title: Innovations by Ming-Jun Wang in Integrated Circuit Fabrication

Introduction

Ming-Jun Wang is a notable inventor based in Taichung County, Taiwan. He has made significant contributions to the field of integrated circuit fabrication, particularly through his innovative patent that enhances the performance of semiconductor devices.

Latest Patents

Ming-Jun Wang holds a patent for a "High selectivity etching process for metal gate N/P patterning." This method involves a series of etching processes designed to fabricate integrated circuits with improved performance. The process begins with providing a substrate and forming a hard mask layer over it. It includes creating protected and unprotected portions of the hard mask layer, followed by a sequence of etching processes that carefully remove the unprotected portions while preserving the integrity of the protected areas. This innovative approach is crucial for advancing semiconductor technology.

Career Highlights

Ming-Jun Wang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on developing methods that enhance the efficiency and performance of integrated circuits. With a patent portfolio that includes 1 patent, he has established himself as a key contributor to technological advancements in his field.

Collaborations

Ming-Jun Wang collaborates with talented professionals such as Fang Wen Tsai and Matt Yeh. Their combined expertise fosters an environment of innovation and creativity, driving forward the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Ming-Jun Wang's contributions to integrated circuit fabrication through his innovative patent demonstrate his commitment to advancing technology in the semiconductor industry. His work not only enhances performance but also sets a foundation for future innovations in the field.