Ming Hsun Wu

Title: The Innovative Contributions of Ming Hsun Wu

Introduction

Ming Hsun Wu is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor structure and method of forming it.

Latest Patents

Ming Hsun Wu holds 1 patent for his invention titled "Semiconductor structure and method of forming thereof." This patent describes a method that includes several operations for forming a semiconductor structure. The process involves forming conductors in a first dielectric layer on a substrate, creating first conductive vias that overlap the conductors in a second dielectric layer, and forming electrodes in a third dielectric layer. Each electrode overlaps one of the first conductive vias. The method also includes the formation of a hard mask on the third dielectric layer, mandrel exposures on the hard mask, and patterning spacers on the sidewalls of the mandrel exposures. The hard mask is then patterned based on these spacers, leading to the formation of conductive lines in the third dielectric layer.

Career Highlights

Ming Hsun Wu is currently employed at Nan Ya Technology Corporation, where he continues to advance semiconductor technology. His work is characterized by a commitment to innovation and excellence in the field.

Collaborations

Ming Hsun Wu collaborates with talented individuals such as Hsueh-Han Lu and Yao Ching Chiu. These collaborations enhance the innovative potential of their projects and contribute to the advancement of technology.

Conclusion

Ming Hsun Wu's contributions to semiconductor technology exemplify the spirit of innovation. His patent and ongoing work at Nan Ya Technology Corporation highlight his role as a key figure in the field. His collaborations further strengthen the impact of his inventions.