Ming-Hsiao Weng

Title: The Innovations of Ming-Hsiao Weng

Introduction

Ming-Hsiao Weng is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in overlay measurement methodologies. With a total of 2 patents to his name, Weng continues to push the boundaries of innovation in his industry.

Latest Patents

Weng's latest patents focus on a frequency-picked methodology for diffraction-based overlay measurement. This innovative overlay error measurement method involves disposing a lower-layer pattern over a substrate. The process includes arranging a first pattern with a plurality of sub-patterns extending in a specific direction and pitch. Additionally, a second pattern is disposed with smaller sub-patterns interleaved between the first sub-patterns. An upper-layer pattern is then placed over the lower-layer pattern to determine the overlay error between the two layers.

Career Highlights

Ming-Hsiao Weng is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing measurement techniques that enhance the precision of semiconductor manufacturing processes.

Collaborations

Weng collaborates with various professionals in his field, including his coworker Hung-Chih Hsieh. Their combined expertise contributes to the innovative projects at Taiwan Semiconductor Manufacturing Company Limited.

Conclusion

Ming-Hsiao Weng's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a key innovator in the industry. His work continues to influence the future of overlay measurement methodologies.