This inventor holds 10 USPTO granted patents and 9 published patent applications. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Taiwan Semiconductor Manufacturing Co., Ltd.. Active years: 2020-2026.
Company Filing History:
9 out of 42,759 
1 out of 463 Years Active: 2020-2026
Title: The Innovative Contributions of Ming-Ho Lin
Introduction
Ming-Ho Lin is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on advancing semiconductor devices and their manufacturing processes.
Latest Patents
Ming-Ho Lin's latest patents include innovative methods for forming semiconductor devices. One of his notable patents is titled "Dielectric layer on semiconductor device and method of forming the same." This method involves forming a first layer on a semiconductor fin and utilizing a mask to thin the first layer along the sidewall of the fin. A second layer is then formed, covering both the mask and the first layer. Another significant patent is "Non-conformal oxide liner and manufacturing methods thereof." This method describes the formation of a fin protruding over a substrate, followed by the creation of a conformal oxide layer and a non-conformal oxide layer, ultimately leading to the formation of a gate electrode.
Career Highlights
Ming-Ho Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have contributed to the company's advancements in semiconductor technology.
Collaborations
Ming-Ho Lin has collaborated with several talented individuals in his field, including Chun-Heng Chen and Cheng-I Lin. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.
Conclusion
Ming-Ho Lin's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor manufacturing processes.