Ming-Chih Yeh

Title: The Innovative Contributions of Ming-Chih Yeh

Introduction

Ming-Chih Yeh is a notable inventor based in Linkou, Taiwan. He has made significant contributions to the field of chemical-mechanical polishing, particularly in applications involving titanium nitride (TiN) and silicon nitride (SiN). His work has implications for various industries, including semiconductor manufacturing.

Latest Patents

Ming-Chih Yeh holds a patent for "Nitride inhibitors for high selectivity of TiN—SiN CMP applications." This invention provides a chemical-mechanical polishing composition that includes abrasive particles and a removal rate inhibitor. The removal rate inhibitor can be a surfactant with specific functional groups, enhancing the effectiveness of the polishing process. The invention also outlines a method for chemically-mechanically polishing a substrate that comprises TiN and SiN using this innovative composition. He has 1 patent to his name.

Career Highlights

Ming-Chih Yeh is associated with CMC Materials, Inc., where he applies his expertise in developing advanced materials for polishing applications. His work at the company has positioned him as a key player in the field of materials science.

Collaborations

Ming-Chih Yeh has collaborated with notable colleagues, including Chih-Hsien Chien and Yi-Hong Chiu. These collaborations have contributed to the advancement of technologies in the polishing sector.

Conclusion

Ming-Chih Yeh's innovative work in chemical-mechanical polishing compositions demonstrates his commitment to advancing technology in the semiconductor industry. His contributions are vital for improving manufacturing processes and enhancing product quality.