This inventor holds 1 USPTO granted patent. Top assignee: Ram Technology Co., Ltd.. Active years: 2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2009
Title: Min-Young Kim: Innovator in Photoresist Removal Technology
Introduction
Min-Young Kim is a notable inventor based in Incheon, South Korea. He has made significant contributions to the field of materials science, particularly in the development of compositions for removing photoresist. His innovative approach has implications for various applications in semiconductor manufacturing.
Latest Patents
Min-Young Kim holds a patent for a "Composition for removing photoresist and method of forming a pattern using the same." This patent describes a method where a layer is formed on a substrate, followed by the creation of a photoresist pattern. The method involves etching a portion of the layer exposed by the photoresist pattern, using it as an etching mask to form a pattern on the substrate. The photoresist pattern is then removed using a composition that includes hydroxylamine, an alkanolamine-based compound, a morpholine-based compound, a polar solvent, a corrosion preventing agent, and water. This composition effectively removes the photoresist pattern and etched residues without damaging the substrate or the pattern, which may include metal, nitride, oxide, and/or metal nitride.
Career Highlights
Min-Young Kim is currently employed at Ram Technology Co., Ltd., where he continues to innovate in the field of photoresist removal technologies. His work has been instrumental in advancing the efficiency and effectiveness of semiconductor processing techniques.
Collaborations
Some of his coworkers include Sok-Ho Yi and Kyong-Hee Kim, who contribute to the collaborative environment at Ram Technology Co., Ltd. Their combined expertise fosters innovation and drives the development of new technologies.
Conclusion
Min-Young Kim's contributions to the field of photoresist removal technology highlight his role as a key innovator in the semiconductor industry. His patent reflects a significant advancement in the methods used for pattern formation, showcasing his commitment to improving manufacturing processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile