Yongin, South Korea

Min-Woung Choi

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Min-Woung Choi. Retrieved from https://idiyas.com/inventor/min-woung-choi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Min-Woung Choi: Innovator in Semiconductor Manufacturing

Introduction

Min-Woung Choi is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative approaches to plasma processing methods.

Latest Patents

Min-Woung Choi holds a patent for a plasma processing method of a semiconductor manufacturing apparatus. This method is designed to minimize the amount of impurities that adhere to the surface of a wafer during plasma processing. The patent outlines a process where, after the desired operation is completed, the plasma generated over the wafer is diffused before the wafer is de-chucked. This innovation enhances the efficiency and quality of semiconductor manufacturing.

Career Highlights

Choi is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of advancements in semiconductor technology.

Collaborations

Throughout his career, Min-Woung Choi has collaborated with notable colleagues, including Hyun-Su Jun and Ki-Sang Kim. These collaborations have contributed to the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Min-Woung Choi's contributions to semiconductor manufacturing through his innovative plasma processing methods highlight his role as a key inventor in the field. His work continues to influence advancements in technology and manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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