Shanghai, China

Min Nie

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Teradyne (Asia) Pte. Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Min Nie. Retrieved from https://idiyas.com/inventor/min-nie-5dklkfzq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Min Nie - Innovator in DUT Simulation Equipment

Introduction

Min Nie is a notable inventor based in Shanghai, China. He has made significant contributions to the field of simulation equipment, particularly with his innovative device under test (DUT) simulation equipment. His work is characterized by a focus on enhancing testing processes in electronic devices.

Latest Patents

Min Nie holds a patent for a device under test simulation equipment. This equipment includes a first circuit board with a field programmable gate array (FPGA), a second circuit board with a processor, and a power distribution board. The design allows the first circuit board to receive power from the power distribution board while simulating the performance of a DUT. The DUT simulation equipment is capable of providing a response signal after receiving a test signal from a tester, showcasing its effectiveness in testing scenarios.

Career Highlights

Min Nie is currently employed at Teradyne (Asia) Pte. Ltd., where he continues to develop and refine his innovative technologies. His work at Teradyne has positioned him as a key player in the field of testing and simulation equipment.

Collaborations

Min has collaborated with talented coworkers such as Yi Hou and Siqiang Jia. Their combined expertise contributes to the advancement of technology in their field.

Conclusion

Min Nie's contributions to DUT simulation equipment highlight his innovative spirit and dedication to improving testing processes. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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