This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Hubei Dinghui Microelectronics Materials Co., Ltd. Active years: 2021.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2021
Title: Min Liu - Innovator in Polishing Technology
Introduction
Min Liu is a prominent inventor based in Wuhan, China. He has made significant contributions to the field of polishing technology, particularly in chemical-mechanical planarization treatment. His innovative work has led to the development of advanced materials that enhance the efficiency and effectiveness of polishing processes.
Latest Patents
Min Liu holds a patent for a polyurethane polishing layer, which includes a polishing pad and methods for preparing the polishing layer and planarizing materials. This invention is characterized by a polyurethane polishing layer that has a coefficient of thermal expansion of 100-200 ppm/°C. The layer is composed of a reaction product from multiple components, including an isocyanate-terminated prepolymer, a hollow microsphere polymer, and a curing agent composition. The curing agent composition consists of 5-55 wt % of an aliphatic diamine composition, 0-8 wt % of a polyamine composition, and 40-90 wt % of an aromatic bifunctional composition. The polyurethane polishing layer boasts a density of 0.6-1.1 g/cm³, a Shore hardness of 45-70D, and an elongation at break of 50-450%. This innovative layer is prepared through a simple process that is low in cost and energy consumption, while also providing high hydrolytic stability, uniform density, and a stable removal rate.
Career Highlights
Min Liu is currently employed at Hubei Dinghui Microelectronics Materials Co., Ltd. His work at this company has allowed him to focus on the development of advanced materials for the microelectronics industry. His contributions have been instrumental in improving the performance and reliability of polishing processes used in semiconductor manufacturing.
Collaborations
Min Liu has collaborated with notable colleagues, including Shunquan Zhu and Yijie Luo. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of polishing technology.
Conclusion
Min Liu's innovative work in the development of polyurethane polishing layers has made a significant impact on the polishing technology landscape. His contributions continue to advance the efficiency and effectiveness of chemical-mechanical planarization processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile