This inventor holds 1 USPTO granted patent. Top assignee: Semes Co., Ltd.. Active years: 2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2018
Title: Min Jun Cho: Innovator in Substrate Treatment Technology
Introduction
Min Jun Cho is a prominent inventor based in Chungcheongnam-do, South Korea. He has made significant contributions to the field of substrate treatment technology. His innovative approach has led to the development of a unique method that utilizes supercritical fluids for substrate processing.
Latest Patents
Min Jun Cho holds a patent for an "Apparatus and method for treating substrate." This patent describes a method in which a supercritical fluid is supplied into a chamber containing the substrate. The process involves a supply step where the supercritical fluid is introduced until the chamber reaches a preset pressure. Following this, a substrate treating step is performed, which includes the repeated supply and exhaust of the supercritical fluid. Notably, the flow rate of the supercritical fluid can be adjusted during the supply step, enhancing the treatment process.
Career Highlights
Min Jun Cho is associated with Semes Co., Ltd., where he applies his expertise in substrate treatment technologies. His work has been instrumental in advancing the capabilities of the company in this specialized field. With a focus on innovation, he continues to explore new methods and applications for substrate treatment.
Collaborations
Min Jun Cho collaborates with talented colleagues, including Young Hun Lee and Eui Sang Lim. Their combined efforts contribute to the ongoing development of cutting-edge technologies in their field.
Conclusion
Min Jun Cho's contributions to substrate treatment technology exemplify the spirit of innovation. His patented method utilizing supercritical fluids showcases his commitment to advancing industrial processes. Through his work at Semes Co., Ltd., he continues to push the boundaries of what is possible in substrate treatment.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
