The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 22, 2018

Filed:

Aug. 30, 2016
Applicant:

Semes Co., Ltd., Chungcheongnam-do, KR;

Inventors:

Young Hun Lee, Chungcheongnam-do, KR;

Eui Sang Lim, Busan, KR;

Min Jun Cho, Chungcheongnam-do, KR;

Jae Myoung Lee, Chungcheongnam-do, KR;

Assignee:

SEMES CO., LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/306 (2006.01); B08B 7/00 (2006.01); F26B 21/10 (2006.01); F26B 21/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02101 (2013.01); B08B 7/0021 (2013.01); F26B 21/06 (2013.01); F26B 21/10 (2013.01); H01L 21/02046 (2013.01); H01L 21/30604 (2013.01); H01L 21/67017 (2013.01); H01L 21/67028 (2013.01); H01L 21/67034 (2013.01); H01L 21/67069 (2013.01);
Abstract

A method for treating a substrate, in which a supercritical fluid is supplied into a chamber, in which the substrate is carried, to treat the substrate, the method including a supply step of supplying the supercritical fluid into the chamber until a pressure of the interior of the chamber reaches a preset pressure, and a substrate treating step of performing a supercritical process while repeating supply and exhaust of the supercritical fluid into and out of the interior of the chamber after the supply step, wherein a flow rate of the supercritical fluid supplied into the chamber in the supply step is variable.


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