Gwangju, South Korea

Min Hwan Lee

This inventor holds 1 USPTO granted patent. Top assignee: Sk Holdings Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Min Hwan Lee. Retrieved from https://idiyas.com/inventor/min-hwan-lee-vzclsns8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Min Hwan Lee: Innovator in Semiconductor Manufacturing

Introduction

Min Hwan Lee is a prominent inventor based in Gwangju, South Korea. He has made significant contributions to the field of semiconductor manufacturing through his innovative approaches. His work focuses on utilizing machine learning to enhance manufacturing processes and yield predictions.

Latest Patents

Min Hwan Lee holds a patent for a "Machine learning-based semiconductor manufacturing yield prediction system and method." This invention provides a method for predicting yield results by learning different neural network models. The approach involves classifying various types of data and inputting them into appropriate neural network models. This ensures that the predictions are accurate and tailored to the specific characteristics of each data type.

Career Highlights

Min Hwan Lee is currently employed at Sk Holdings Co., Ltd., where he applies his expertise in machine learning and semiconductor technology. His innovative work has positioned him as a key figure in advancing manufacturing processes within the industry.

Collaborations

He collaborates with notable colleagues, including Myung Seung Son and Yong Sik Moon, who contribute to the development and implementation of his innovative ideas.

Conclusion

Min Hwan Lee's contributions to semiconductor manufacturing through machine learning exemplify the intersection of technology and innovation. His work not only enhances manufacturing efficiency but also sets a precedent for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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