Min-Hung Chang

Title: Min-Hung Chang: Innovator in Wafer Inspection Technology

Introduction

Min-Hung Chang is a notable inventor based in Tao-Yuan Hsien, Taiwan. He has made significant contributions to the field of wafer inspection technology, holding a total of 4 patents. His innovative approaches have enhanced the efficiency and effectiveness of inspection processes in semiconductor manufacturing.

Latest Patents

Chang's latest patents include a wafer inspection method and inspection apparatus designed to perform voltage inspections of dies on a wafer using a probe module. This probe module consists of a processing module, a first probe connected to a first electrode point of the die, and a second probe linked to a second electrode point. The processing module provides a driving current through the first probe and obtains an inspection voltage corresponding to the die. The results generated indicate the operating status of the die, thereby reducing inspection costs and enhancing efficiency.

Another significant patent involves a wafer inspection method that inspects dies within a matrix range using a column/row control mechanism. This method allows for fast switching between dies, significantly reducing the total test time required and improving overall inspection efficiency.

Career Highlights

Min-Hung Chang is currently employed at Chroma Ate Inc., a company known for its advanced testing and measurement solutions. His work at Chroma Ate has positioned him as a key player in the development of innovative inspection technologies.

Collaborations

Chang collaborates with talented coworkers, including I-Shih Tseng and Tzu-Tu Chao, who contribute to the advancement of their projects and innovations.

Conclusion

Min-Hung Chang's contributions to wafer inspection technology exemplify his commitment to innovation and efficiency in the semiconductor industry. His patents reflect a deep understanding of the challenges in the field and provide solutions that enhance operational effectiveness.