Company Filing History:
Years Active: 2015-2017
Title: Biography of Min-Hsin Hsieh
Introduction
Min-Hsin Hsieh is a prominent inventor based in Zhubei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of defect detection and filtering for wafers. With a total of two patents to his name, Hsieh's work has been instrumental in enhancing the efficiency and accuracy of semiconductor manufacturing processes.
Latest Patents
Hsieh's latest patents include a "System and method of filtering actual defects from defect information for a wafer." This innovative method involves generating a set of defect candidates for a wafer by receiving initial defect information from a wafer scanning device. The process determines a boundary region on the semiconductor wafer and creates an exclusion region to filter out certain defects. Another notable patent is the "Method of generating a set of defect candidates for wafer," which utilizes graph operations to generate a filtration area and omit a subset of initial defect candidates.
Career Highlights
Min-Hsin Hsieh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at TSMC has allowed him to collaborate with some of the brightest minds in the field, contributing to advancements in semiconductor technology.
Collaborations
Hsieh has worked closely with his coworker, Tsung-Hsien Lee, on various projects related to wafer defect detection and filtering. Their