Min-Choul Kim

Title: Min-Choul Kim: Semiconductor Device Inventor

Introduction

Min-Choul Kim is an inventor based in Hwaseong, South Korea. His work includes semiconductor device inventions, and he is associated with Samsung Electronics Co., Ltd. His listed portfolio includes 3 patents.

Latest Patents

“Semiconductor Device Having a Device Isolation Layer” describes a semiconductor structure with a fin extending from a substrate and intersecting gate structures. A recess between the gates is filled with a device isolation layer whose raised upper surface is coplanar with the gate structures. The design also includes a liner along the isolation layer’s sidewalls and source/drain regions positioned on either side of the recess.

“Semiconductor Device” describes a structure with the same key features: a fin, intersecting gate structures, a recessed region filled by a raised device isolation layer, a sidewall liner, and spaced-apart source/drain regions. These features concern the arrangement of isolation and active regions within a semiconductor device.

Career Highlights

Kim’s listed patent work focuses on semiconductor device structures and the placement of device isolation layers in relation to fins, gates, and source/drain regions. He is associated with Samsung Electronics Co., Ltd., a company active in electronics and semiconductor technologies.

Collaborations

Ju-Youn Kim and Baik-Min Sung are listed as Kim’s coworkers. The provided information does not specify their roles in the patents or the nature of their collaboration.

Conclusion

Min-Choul Kim’s listed inventions address semiconductor device architecture, particularly the integration of device isolation layers with fin and gate structures. His patent portfolio and association with Samsung Electronics reflect a focus on semiconductor technology.