Kaohsiung, Taiwan

Min-Chi Wang

USPTO Granted Patents = 2 

Average Co-Inventor Count = 13.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2010-2012

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2 patents (USPTO):Explore Patents

Title: Min-Chi Wang: Innovator in Polyimide/Silica Composite Materials

Introduction

Min-Chi Wang is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of polyimide/silica composite materials. With a total of 2 patents, his work is instrumental in advancing technologies used in microelectronics and semiconductor applications.

Latest Patents

Wang's latest patents focus on a precursor solution for polyimide/silica composite material and its manufacturing method. The patents detail a process for preparing a precursor solution that allows a poly(amic acid) to carry a silica moiety. This involves adding a monomer of a silane compound and a photo-polymerizable unsaturated group to enhance the material's properties. The resulting polyimide/silica composite material exhibits low volume shrinkage, making it particularly useful in microelectronic devices, semiconductor elements, and photoelectric elements.

Career Highlights

Min-Chi Wang is associated with Eternal Chemical Co., Ltd., where he continues to innovate and develop advanced materials. His expertise in the field has led to significant advancements in the applications of polyimide/silica composites. Wang's work is characterized by a commitment to enhancing the performance and reliability of materials used in high-tech industries.

Collaborations

Wang has collaborated with notable colleagues, including Chung-Jen Wu and Chung-Hung Chang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of materials science.

Conclusion

Min-Chi Wang's contributions to the development of polyimide/silica composite materials highlight his role as a key innovator in the field. His patents and ongoing work continue to influence advancements in microelectronics and semiconductor technologies.

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