Kitakami, Japan

Miki Sakai


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: Miki Sakai: Innovator in Semiconductor Technology

Introduction

Miki Sakai is a prominent inventor based in Kitakami, Japan. She has made significant contributions to the field of semiconductor technology, particularly through her innovative designs and patents. Her work has had a lasting impact on the industry, showcasing her expertise and creativity.

Latest Patents

Miki Sakai holds a patent for a "Transfer gate with the improved cut-off characteristic." This invention involves a transfer gate composed of at least two p-channel MOS FETs and at least two n-channel MOS FETs. The current paths of the n-channel MOS FETs are connected in series, with their conduction controlled by a first control signal applied to the gates. Similarly, the p-channel MOS FETs are connected in series, with their conduction controlled by a second control signal that is opposite in phase to the first. The design allows for enhanced performance and efficiency in semiconductor applications.

Career Highlights

Miki Sakai is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. Her role at Toshiba has allowed her to collaborate with other talented professionals and contribute to groundbreaking projects. With her innovative mindset, she continues to push the boundaries of what is possible in semiconductor technology.

Collaborations

Throughout her career, Miki has worked alongside notable colleagues such as Kazumasa Ando and Hideo Sakai. These collaborations have fostered an environment of creativity and innovation, leading to advancements in their respective fields.

Conclusion

Miki Sakai is a trailblazer in semiconductor technology, with a patent that exemplifies her innovative spirit. Her contributions to the industry, along with her collaborations, highlight her importance as an inventor. Her work continues to inspire future generations of engineers and inventors.

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