The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 1991
Filed:
Dec. 07, 1989
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A transfer gate is made up of at least two p-channel MOS FETs and at least two n-channel MOS FETs. The current paths of the n-channel MOS FETs are connected in series, and the conduction of the FETs is controlled by a first control signal applied to the gates thereof. The current paths of the p-channel MOS FETs are also connected in series, and the conduction of the FETs is controlled by a second control signal applied to the gates thereof. The first and second control signals are opposite phase. The series circuit of the current paths of the p-channel FETs is connected in parallel to the series circuit of the current paths of the n-channel FETs. The p-channel FETs are formed in at least two n-type well regions, which is formed in the major surface region of a p-type semiconductor substrate at different locations separated from each other by predetermined distances.