This inventor holds 2 USPTO granted patents. Top assignee: Asm IP Holding B.v.. Active years: 2015-2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2015-2017
Title: Mike Schmotzer: Innovating in Reaction Chamber Technologies
Introduction
Mike Schmotzer is an innovative inventor based in Scottsdale, Arizona, recognized for his contributions to the field of reaction chamber technologies. With a total of two patents to his name, Schmotzer is committed to advancing the efficiency and functionality of chemical processes.
Latest Patents
Schmotzer’s latest patents focus on methods and systems designed to reduce outgassing in reaction chambers. These inventions include exemplary techniques such as depositing a barrier layer within the reaction chamber and utilizing a scavenging precursor that reacts with surface species. The systems he has developed, especially in the realm of gas-phase deposition— such as atomic layer deposition systems— are notable for their integration of a barrier layer source and scavenging precursor source, which are fluidly connected to the reaction chamber of the system.
Career Highlights
Mike Schmotzer works at ASML Holding B.V., a leading company in the semiconductor industry, where he plays a pivotal role in developing innovative solutions that enhance production processes. His expertise and dedication in this specialized field have made him a valuable asset to the organization.
Collaborations
Throughout his career, Schmotzer has collaborated with esteemed colleagues, including Sung-Hoon Jung and Petri Raisanen. These partnerships have fostered a creative environment that encourages the sharing of ideas and collaborative problem-solving.
Conclusion
Mike Schmotzer's innovative spirit and cutting-edge patents demonstrate his significant impact on the technology behind reaction chambers. His contributions to the field not only enhance operational efficiency but also hold great potential for future advancements in various industrial applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile