The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2015
Filed:
Jul. 12, 2013
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Sung-Hoon Jung, Chandler, AZ (US);
Petri Raisanen, Gilbert, AZ (US);
Eric Jen Cheng Liu, Tempe, AZ (US);
Mike Schmotzer, Scottsdale, AZ (US);
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4404 (2013.01); C23C 16/45525 (2013.01); C23C 16/45534 (2013.01);
Abstract
Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and/or a scavenging precursor source fluidly coupled to a reaction chamber of the system.
Published as:
US2015017319A1; KR20150007989A; US8993054B2; TW201514336A; US2015140210A1; US9790595B2; TWI670393B; KR102186335B1;