This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003
Title: Mike Maxim and Semiconductor Process Innovation.
Introduction
Mike Maxim is an inventor based in San Jose, California, whose patent work addresses semiconductor manufacturing processes. His documented invention concerns optimizing an argon sputter process used in interlayer dielectric (ILD) processing.
Latest Patents
Maxim is associated with 1 patent: “Approach to Optimizing an ILD Argon Sputter Process.” The patent describes a sputter etch system and method that use an etch chamber, a wafer pedestal to support a wafer, and a magnet configured to provide a continuous magnetic field directed at the pedestal’s top surface.
Career Highlights
Maxim works at Intel Corporation. His patent reflects work on sputter etching, a process relevant to semiconductor fabrication.
Collaborations
The provided information lists William G. Petro and Brett E. Huff as Maxim’s coworkers. Their shared association with Intel Corporation provides context for his professional environment, though no specific joint patent work is identified here.
Conclusion
Mike Maxim’s documented patent focuses on an ILD argon sputter process and describes equipment designed to support sputter etching in semiconductor manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile