Bend, OR, United States of America

Mike Littau

This inventor holds 2 USPTO granted patents. Top assignee: Nanometrics Inc.. Active years: 2010-2011.


% Patents Active = 50.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2010-2011

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Mike Littau: Innovator in Microstructure Evaluation

Introduction

Mike Littau is a prominent inventor based in Bend, Oregon. He has made significant contributions to the field of microstructure evaluation, holding 2 patents that showcase his innovative approach to measuring workpieces.

Latest Patents

One of Mike Littau's latest patents is a method for evaluating microstructures on a workpiece based on the orientation of a grating on the workpiece. This method involves measuring a periodic structure, such as a grating, to produce image data. The orientation of features in the image data, which is produced by higher order diffractions from the periodic structure, is identified. The orientation of the periodic structure is then determined based on these features. The image data is modified to correlate with simulated image data, allowing for the ascertainment of parameters of the workpiece. Additionally, optical components in the measuring system or the workpiece itself can be adjusted to achieve a desired alignment, enabling accurate measurement of microstructures.

Career Highlights

Mike Littau is currently employed at Nanometrics Inc., where he continues to develop innovative solutions in the field of microstructure evaluation. His work has been instrumental in advancing measurement techniques that enhance the understanding of material properties.

Collaborations

Mike collaborates with talented individuals such as Darren Forman and Steven G Hummel, contributing to a dynamic work environment that fosters innovation.

Conclusion

Mike Littau is a dedicated inventor whose work in microstructure evaluation has led to significant advancements in measurement techniques. His contributions continue to impact the field positively.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…