Company Filing History:
Years Active: 2019-2020
Title: Mika Tazuru: Innovator in Polishing Compositions
Introduction
Mika Tazuru is a notable inventor based in Kyotanabe, Japan. She has made significant contributions to the field of polishing compositions, holding two patents that showcase her innovative approach to material science.
Latest Patents
Mika Tazuru's latest patents focus on polishing compositions designed to suppress surface defects and reduce haze. The first patent describes a polishing composition that includes abrasives, at least one water-soluble polymer selected from vinyl alcohol-based resins with a 1,2-diol structural unit, a polyalcohol, and an alkali compound. Additionally, it is preferred that the composition includes a non-ionic surfactant. The second patent also emphasizes a polishing composition that can suppress surface defects and reduce haze, featuring similar components. In this case, the average particle size of the particles in the polishing composition, measured by dynamic light scattering, is not more than 55 nm. Again, the inclusion of a non-ionic surfactant and a polyalcohol is preferred.
Career Highlights
Mika Tazuru is currently employed at Nitta Haas Inc., where she continues to develop innovative solutions in her field. Her work has garnered attention for its practical applications and effectiveness in improving polishing processes.
Collaborations
Mika collaborates with talented coworkers, including Noriaki Sugita and Shuhei Matsuda, who contribute to her projects and enhance the innovative environment at Nitta Haas Inc.
Conclusion
Mika Tazuru is a pioneering inventor whose work in polishing compositions has the potential to impact various industries. Her patents reflect her commitment to innovation and excellence in material science.