The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 2019

Filed:

Oct. 20, 2016
Applicant:

Nitta Haas Incorporated, Osaka-shi, Osaka, JP;

Inventors:

Noriaki Sugita, Kyotanabe, JP;

Mika Tazuru, Kyotanabe, JP;

Takayuki Matsushita, Kyotanabe, JP;

Shuhei Matsuda, Kyotanabe, JP;

Assignee:

NITTA HAAS INCORPORATED, Osaka-Shi, Osaka, unknown;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); C09G 1/16 (2006.01); B24B 37/00 (2012.01); C08F 216/06 (2006.01); H01L 21/02 (2006.01); C09K 3/14 (2006.01); H01L 21/321 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); B24B 37/00 (2013.01); C08F 216/06 (2013.01); C09G 1/16 (2013.01); C09K 3/1463 (2013.01); H01L 21/02024 (2013.01); H01L 21/3212 (2013.01);
Abstract

A polishing composition that can suppress surface defects and reduce haze is provided. A polishing composition includes: abrasives; at least one water-soluble polymer selected from vinyl alcohol-based resins having a 1,2-diol structural unit; and an alkali compound, where an average particle size of particles in the polishing composition measured by dynamic light scattering is not more than 55 nm. Preferably, the polishing composition further includes a non-ionic surfactant. Preferably, the polishing composition further includes a polyalcohol.


Find Patent Forward Citations

Loading…