Mika Ishiwata

Title: The Innovations of Mika Ishiwata

Introduction

Mika Ishiwata is a prominent inventor based in Kanagawa, Japan. She has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. Her work focuses on enhancing the efficiency and functionality of plasma chemical vapor deposition (CVD) apparatuses.

Latest Patents

One of her latest innovations is a plasma CVD apparatus designed to prevent unnecessary discharges, such as arc discharges. This invention reduces the amount of particles caused by the peeling of films attached to the reaction chamber. Additionally, it increases the percentage of time contributing to production during the hours of operation of the apparatus while maintaining the enlargement of the apparatus and ensuring easy workability. The plasma CVD apparatus is configured with a conductive reaction chamber that includes a power source, a vacuum exhausting means, and a reaction gas introduction pipe. In this setup, plasma is generated in a space surrounded by an electrode, a substrate holder, and an insulator.

Career Highlights

Mika Ishiwata has worked with notable companies in the semiconductor industry, including Semiconductor Energy Laboratory Co., Ltd. and Sony Corporation. Her experience in these organizations has allowed her to develop and refine her innovative ideas.

Collaborations

Throughout her career, Mika has collaborated with esteemed colleagues such as Shunpei Yamazaki and Toru Takayama. These partnerships have contributed to her success and the advancement of her inventions.

Conclusion

Mika Ishiwata's contributions to the field of semiconductor technology through her innovative patents and collaborations highlight her role as a leading inventor. Her work continues to influence advancements in plasma CVD technology, showcasing her dedication to innovation.