This inventor holds 1 USPTO granted patent. Top assignee: Fujifilm Corporation. Active years: 2010.
Company Filing History:
Years Active: 2010
Title: Mihoko Ishima: Innovator in Metal Polishing Technology
Introduction
Mihoko Ishima is a prominent inventor based in Shizuoka, Japan. She has made significant contributions to the field of semiconductor manufacturing through her innovative work in metal polishing technology. Her expertise and dedication have led to the development of a unique metal polishing liquid that enhances the efficiency and quality of semiconductor devices.
Latest Patents
Mihoko Ishima holds a patent for a metal-polishing liquid and a chemical mechanical polishing method using the same. The invention provides a metal polishing liquid that comprises an oxidizing agent and colloidal silica, where a part of the surface of the colloidal silica is covered with aluminum atoms. This innovative approach includes various components such as an amino acid, a compound having an isothiazoline-3-one skeleton, an organic acid, a passivated film forming agent, a cationic surfactant, a nonionic surfactant, and a water-soluble polymer. The metal polishing liquid is specifically designed for use in chemical mechanical polishing during the manufacturing of semiconductor devices. It achieves low dishing of the subject to be polished and ensures excellent in-plane uniformity of the surface being polished. Mihoko Ishima has 1 patent to her name.
Career Highlights
Mihoko Ishima is currently employed at Fujifilm Corporation, where she continues to advance her research and development efforts in the field of semiconductor manufacturing. Her work has been instrumental in improving the processes involved in metal polishing, which is critical for the production of high-quality semiconductor devices.
Collaborations
Mihoko has collaborated with notable colleagues such as Katsuhiro Yamashita and Yoshinori Nishiwaki. Their combined expertise has contributed to the success of various projects within the semiconductor industry.
Conclusion
Mihoko Ishima's innovative contributions to metal polishing technology have made a significant impact on the semiconductor manufacturing process. Her dedication to research and development continues to drive advancements in the field, ensuring the production of high-quality semiconductor devices.