Michiko Okubo

Title: Michiko Okubo: Innovator in Sputtering Technology

Introduction

Michiko Okubo is a prominent inventor based in Kawasaki, Japan. She has made significant contributions to the field of sputtering technology, holding a total of 3 patents. Her work focuses on methods and apparatuses that enhance the quality and efficiency of thin film production.

Latest Patents

One of her latest patents is a sputtering apparatus and sputtering method. This invention involves a film forming vessel where a substrate is positioned opposite a magnetron sputtering source. The source is designed to create magnetron plasma near the target while also serving as a holder for the target material. An auxiliary electromagnet is included to reduce the spatially dispersed amount of magnetron plasma near the substrate's surface. This innovative setup allows for the formation of high-quality thin films over large areas with excellent repeatability. Another notable patent is a method of processing a magnetic thin film. This method includes placing a mask with a specific pattern on a magnetic thin film made from materials like Fe, Co, and Ni. A reactive gas is then supplied to the exposed areas, allowing for precise patterning of the magnetic thin film.

Career Highlights

Michiko Okubo is associated with Kabushiki Kaisha Toshiba, where she continues to develop her innovative technologies. Her work has been instrumental in advancing the field of thin film technology, particularly in applications that require high precision and quality.

Collaborations

She has collaborated with notable coworkers, including Katsutaro Ichihara and Nobuaki Yasuda, contributing to various projects that enhance the capabilities of sputtering technology.

Conclusion

Michiko Okubo's contributions to sputtering technology and thin film production are noteworthy. Her innovative patents and collaborative efforts continue to influence advancements in the field.