The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 1998
Filed:
Apr. 19, 1996
Michiko Okubo, Kawasaki, JP;
Naoyuki Inoue, Yokohama, JP;
Katsutaro Ichihara, Yokohama, JP;
Nobuaki Yasuda, Zushi, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
In a film forming vessel, a substrate destined to carry on the surface thereof a thin film to be formed and a magnetron sputtering source integrally composed of an electric field supply means and a main magnetic field supply means for forming magnetron plasma in the neighborhood of the target and concurrently serving as a target holder for retaining a target in place are disposed as opposed to each other. An electromagnet as an auxiliary magnetic field supply means for decreasing the spatially dispersed amount of magnetron plasma in the neighborhood of the surface of the substrate is also laid out in the film forming vessel. A thin film of compound, for example, is formed on the substrate, with the spatially dispersed amount of magnetron plasma in the neighborhood of the surface of the substrate decreased as described above. As a result, the thin film of excellent quality is formed with high repeatability on a large surface area.