Company Filing History:
Years Active: 2017
Title: Michihiro Yokoo: Innovator in Nickel Thin Film Technology
Introduction
Michihiro Yokoo is a prominent inventor based in Tsukuba, Japan. He is known for his significant contributions to the field of materials science, particularly in the production of nickel thin films. His innovative methods have paved the way for advancements in semiconductor technology.
Latest Patents
Yokoo holds a patent for a "Method for producing nickel thin film on a Si substrate by chemical vapor deposition method, and method for producing Ni silicide thin film on Si substrate." This patent describes a process where a nickel thin film is formed using a hydrocarbon-type nickel complex as a raw material. The method involves specific film formation conditions, including the use of hydrogen as a reaction gas and maintaining a film formation pressure of 1 to 150 torr at temperatures between 80 to 250°C.
Career Highlights
Yokoo is associated with Tanaka Kikinzoku Kogyo K.K., where he has been instrumental in developing advanced materials for various applications. His work has not only contributed to the company's success but has also enhanced the understanding of nickel thin film production in the industry.
Collaborations
Throughout his career, Yokoo has collaborated with notable colleagues, including Shunichi Nabeya and Ryosuke Harada. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Michihiro Yokoo's contributions to nickel thin film technology exemplify the impact of innovative thinking in materials science. His patented methods continue to influence the semiconductor industry and highlight the importance of research and development in advancing technology.