Company Filing History:
Years Active: 2007
Title: Michelle Lupan: Innovator in Plasma Processing Technologies
Introduction
Michelle Lupan is a prominent inventor based in Danville, CA (US). She has made significant contributions to the field of plasma processing, particularly in the development of methods for enhancing the performance and longevity of silicon and silicon carbide electrodes. With a total of 2 patents, her work is recognized for its innovative approaches to solving complex challenges in semiconductor manufacturing.
Latest Patents
Michelle Lupan's latest patents include groundbreaking methods for removing black silicon and black silicon carbide from surfaces of silicon and silicon carbide electrodes used in plasma processing apparatuses. The first patent outlines methods for forming a plasma using a gas composition containing a fluorine-containing gas, effectively removing black silicon or black silicon carbide from the surface of the upper electrode in a plasma processing chamber. This method can also be applied to other components within the chamber. The second patent focuses on protecting silicon or silicon carbide electrode surfaces from morphological modifications during plasma etch processing. It describes methods for forming a protective polymeric coating on the electrode, which safeguards the underlying surface from exposure to plasma constituents and gaseous reactants.
Career Highlights
Michelle Lupan is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. Her work at Lam Research has positioned her as a key player in advancing plasma processing technologies.
Collaborations
Throughout her career, Michelle has collaborated with notable colleagues, including Enrico Magni and Michael Kelly. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Michelle Lupan's contributions to plasma processing technologies demonstrate her commitment to innovation in the semiconductor industry. Her patents reflect her expertise and dedication to improving manufacturing processes, making her a valuable asset to Lam Research Corporation and the field at large.