Cossonay, Switzerland

Michel Rossi

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignees: Ecole Polytechnique Federale De Lausanne, Fei Comapny. Active years: 2010-2018.


% Patents Active = 100.0


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 2010-2018

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2 patents (USPTO):Explore Patents

Title: Michel Rossi: Innovator in Beam-Induced Etching

Introduction

Michel Rossi is a notable inventor based in Cossonay, Switzerland. He has made significant contributions to the field of material processing, particularly through his innovative patents. With a total of 2 patents, Rossi's work focuses on enhancing the efficiency and effectiveness of etching processes.

Latest Patents

One of Rossi's latest patents is centered around beam-induced etching. This method and apparatus utilize a beam-activated gas to etch materials. The invention is particularly advantageous for electron beam-induced etching of chromium materials on lithography masks. In one embodiment, a polar compound, such as ClNO gas, is activated by the electron beam to selectively etch chromium material on a quartz substrate. By employing an electron beam instead of an ion beam, many issues associated with ion beam mask repair, such as staining and riverbedding, are effectively mitigated. Additionally, endpoint detection is not critical, as the electron beam and gas do not significantly etch the substrate.

Career Highlights

Throughout his career, Michel Rossi has worked with esteemed organizations, including the École Polytechnique Fédérale de Lausanne and FEI Company. His experience in these institutions has allowed him to refine his skills and contribute to advancements in the field of material processing.

Collaborations

Rossi has collaborated with notable colleagues, including Tristan Bret and Xavier Multone. These partnerships have further enriched his work and fostered innovation in his projects.

Conclusion

Michel Rossi's contributions to beam-induced etching demonstrate his commitment to advancing technology in material processing. His innovative patents and collaborations highlight his role as a significant figure in the field.

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