Michel Montier

Title: Michel Montier: Innovator in Plasma Etching Technology

Introduction

Michel Montier is a notable inventor based in Grenoble, France. He has made significant contributions to the field of plasma etching technology, particularly through his innovative patent. His work focuses on enhancing the efficiency and precision of the etching process, which is crucial in various manufacturing applications.

Latest Patents

Michel Montier holds a patent for a "Process and device for monitoring the plasma etching of thin layer." This invention outlines a method that includes identifying a plateau in gas pressure that occurs slightly before the end of the etching process. The process also involves detecting a pressure variation, either an increase or decrease, from the plateau pressure. The etching is then halted at a predetermined time interval after the variation begins. The device comprises one or more pressure sensors and mechanisms for determining the plateau and subsequent pressure variation.

Career Highlights

Montier is associated with the company Société Pour L'Étude Et La Fabrication De Circuits Intégrés Spéciaux. His role in this organization has allowed him to apply his expertise in plasma etching, contributing to advancements in integrated circuit technology. His innovative approach has positioned him as a key figure in the field.

Collaborations

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Conclusion

Michel Montier's contributions to plasma etching technology exemplify the impact of innovation in manufacturing processes. His patent reflects a deep understanding of the complexities involved in etching thin layers, showcasing his role as a significant inventor in this domain.