The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1982
Filed:
Jul. 22, 1981
Applicant:
Inventor:
Michel Montier, Grenoble, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
156626 ; 73 37 ; 73717 ; 156643 ; 156345 ; 2041 / ;
Abstract
A process and device for plasma etching a thin layer. The process includes the steps of identifying a plateau in gas pressure that occurs slightly before the end of etching and then detecting a pressure variation (increase or decrease) from the plateau pressure. Etching is stopped at a predetermined time interval after the variation following the plateau begins. The device includes one or more pressure sensors and means for determining the plateau and subsequent pressure variation.