Michael Xie

Title: Michael Xie: Innovator in EUV Technology

Introduction

Michael Xie is a prominent inventor based in Shanghai, China. He is known for his contributions to the field of extreme ultraviolet (EUV) technology. His innovative work has led to advancements that are crucial for the semiconductor industry.

Latest Patents

Michael Xie holds a patent for "In-situ in-band and out-of-band spectral measurement for EUV tools." This invention involves a substrate mounted on a chuck within a chamber of an EUV tool. The design includes an illumination aperture that provides a beam of light to illuminate the substrate. This beam consists of extreme ultraviolet (EUV) in-band (IB) light and out-of-band (OOB) light, with the latter having longer wavelengths than the EUV IB light. The invention features a beam-narrowing aperture that selectively narrows the beam of light, along with a band-selection filter that filters out either the OOB light or the EUV IB light. Imaging optics relay the light from the substrate to an imaging plane, where a grating spectrally disperses the light. A sensor then detects the light from the substrate, completing the measurement process.

Career Highlights

Michael Xie is currently employed at Kla Corporation, a leading company in the semiconductor equipment industry. His work at Kla Corporation has positioned him as a key player in the development of advanced EUV technologies. His innovative approach and technical expertise have significantly contributed to the company's success.

Collaborations

Michael collaborates with talented professionals in his field, including Rajeev Rajendran and Farid Atry. These collaborations enhance the innovative capabilities of their projects and contribute to the advancement of EUV technology.

Conclusion

Michael Xie's contributions to EUV technology through his patent and work at Kla Corporation highlight his role as an influential inventor in the semiconductor industry. His innovative spirit continues to drive advancements in this critical field.