Michael W Owens

Title: Michael W. Owens: Innovator in Semiconductor Solutions

Introduction

Michael W. Owens is a notable inventor based in Ridgefield, CT (US). He is recognized for his contributions to the field of semiconductor technology, particularly in the development of solutions that enhance the efficiency of mask material removal.

Latest Patents

Owens holds a patent for an innovative aqueous cerium-containing solution designed to extend the bath lifetime for removing mask material. This aqueous solution comprises a cerium (IV) complex or salt, which can achieve an extended lifetime through the addition of booster additives or by generating a cerium (III) complex in-situ. This solution is particularly effective in removing ion implanted and patterned photoresist from semiconductor substrates.

Career Highlights

Throughout his career, Michael W. Owens has worked with prominent companies in the technology sector. He has been associated with International Business Machines Corporation (IBM) and Advanced Technology Materials, Inc. His work in these organizations has significantly contributed to advancements in semiconductor processing.

Collaborations

Owens has collaborated with talented individuals in his field, including Ali Afzali-Ardakani and John Anthony Fitzsimmons. These collaborations have fostered innovation and development in semiconductor technologies.

Conclusion

Michael W. Owens stands out as an influential inventor in the semiconductor industry, with a focus on improving material removal processes. His patent and career achievements reflect his commitment to innovation and excellence in technology.