International Business Machines Corporation

Advanced Technology Materials, Inc.

Michael W Owens

Ali Afzali-Ardakani

John Anthony Fitzsimmons

Emanuel Israel Cooper

Mahmoud M Khojasteh

Nicholas C M Fuller

Karl E Boggs

George Gabriel Totir

Jennifer V Muncy

James L Simpson

An aqueous solution of a cerium (IV) complex or salt having an extended lifetime is provided. In one embodiment, the extended lifetime is achieved by adding at least one booster additive to an aqueous solution of the cerium (IV) complex or salt. In another embodiment, the extended lifetime is achieved by providing an aqueous solution of a cerium (IV) complex or salt and a cerium (III) complex or salt. The cerium (III) complex or salt can be added or it can be generated in-situ by introducing a reducing agent into the aqueous solution of the cerium (IV) complex or salt. The aqueous solution can be used to remove a mask material, especially an ion implanted and patterned photoresist, from a surface of a semiconductor substrate.

Aqueous cerium-containing solution having an extended bath lifetime for removing mask material

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Ridgefield, CT, United States of America

Michael W Owens