The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2013
Filed:
Nov. 14, 2011
Ali Afzali-ardakani, Ossining, NY (US);
John A. Fitzsimmons, Poughkeepsie, NY (US);
Nicholas C. M. Fuller, North Hills, NY (US);
Mahmoud Khojasteh, Poughkeepsie, NY (US);
Jennifer V. Muncy, Ridgefield, CT (US);
George G. Totir, Newtown, CT (US);
Karl E. Boggs, Hopewell Junction, NY (US);
Emanuel I. Cooper, Scarsdale, NY (US);
Michael W. Owens, Ridgefield, CT (US);
James L. Simpson, Austin, TX (US);
Ali Afzali-Ardakani, Ossining, NY (US);
John A. Fitzsimmons, Poughkeepsie, NY (US);
Nicholas C. M. Fuller, North Hills, NY (US);
Mahmoud Khojasteh, Poughkeepsie, NY (US);
Jennifer V. Muncy, Ridgefield, CT (US);
George G. Totir, Newtown, CT (US);
Karl E. Boggs, Hopewell Junction, NY (US);
Emanuel I. Cooper, Scarsdale, NY (US);
Michael W. Owens, Ridgefield, CT (US);
James L. Simpson, Austin, TX (US);
International Business Machines Corporation, Armonk, NY (US);
Advanced Technology Materials, Inc., Danbury, CT (US);
Abstract
An aqueous solution of a cerium (IV) complex or salt having an extended lifetime is provided. In one embodiment, the extended lifetime is achieved by adding at least one booster additive to an aqueous solution of the cerium (IV) complex or salt. In another embodiment, the extended lifetime is achieved by providing an aqueous solution of a cerium (IV) complex or salt and a cerium (III) complex or salt. The cerium (III) complex or salt can be added or it can be generated in-situ by introducing a reducing agent into the aqueous solution of the cerium (IV) complex or salt. The aqueous solution can be used to remove a mask material, especially an ion implanted and patterned photoresist, from a surface of a semiconductor substrate.