This inventor holds 2 USPTO granted patents. Top assignee: Advanced Technology Materials, Inc.. Active years: 2002-2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2002-2003
Title: Michael W. Hayes: Innovator in Ion Implantation Technology
Introduction
Michael W. Hayes is a notable inventor based in San Jose, CA, with a focus on advancements in ion implantation technology. He holds 2 patents that contribute significantly to the field. His work is characterized by innovative solutions that address environmental and operational challenges in ion implantation processes.
Latest Patents
One of his latest patents is the Integrated Ion Implant Scrubber System. This invention encompasses an ion implantation process system, which includes an ion implanter apparatus designed for executing the ion implantation process. The system features a supply of source gas that flows to the ion implanter apparatus, which subsequently discharges an effluent gas stream containing ionization products of the source gas during the implantation process. Additionally, the system incorporates an effluent abatement apparatus that effectively removes hazardous effluent species from the gas stream. The source gas is sourced from a low-pressure gas source, where it is sorptively retained in a vessel on a sorbent medium with an affinity for the gas, allowing for desorption and dispensing to the process system. A novel scrubbing composition is utilized for effluent treatment, and the breakthrough of scrubbable components in the scrubbing composition can be monitored using a quartz microbalance monitor.
Career Highlights
Michael W. Hayes has made significant contributions to the field of ion implantation while working at Advanced Technology Materials, Inc. His expertise and innovative mindset have positioned him as a key player in the development of advanced technologies.
Collaborations
Throughout his career, Michael has collaborated with notable colleagues, including Mark R. Holst and Jose I. Arno. These collaborations have further enhanced the impact of his work in the industry.
Conclusion
Michael W. Hayes is a distinguished inventor whose contributions to ion implantation technology are noteworthy. His innovative patents and collaborative efforts continue to shape advancements in the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile