This inventor holds 2 USPTO granted patents. Top assignees: International Business Machines Corporation, Tokyo Electron Limited. Active years: 2007.
Company Filing History:
2 out of 166,159 
2 out of 10,837 
Years Active: 2007
Title: Michael Toeller: Innovator in Ultra-Thin Oxide and Oxynitride Layer Technologies
Introduction
Michael Toeller is a notable inventor based in Austin, TX (US). He has made significant contributions to the field of materials science, particularly in the formation of ultra-thin oxide and oxynitride layers. With a total of 2 patents, Toeller's work has implications for various applications in semiconductor technology.
Latest Patents
Toeller's latest patents include the "Formation of ultra-thin oxide layers by self-limiting interfacial oxidation." This invention focuses on utilizing low-pressure processing to achieve self-limiting oxidation of substrates, resulting in ultra-thin oxide layers. The substrates can contain an initial dielectric layer or may lack one entirely. The processing can be conducted in either a batch-type process chamber or a single-wafer process chamber. One embodiment of this invention allows for the self-limiting oxidation of silicon substrates, producing silicon oxide layers with a thickness of approximately 15 Å, with minimal variation across the substrates.
Another significant patent is the "Method of forming uniform ultra-thin oxynitride layers." Similar to his previous work, this invention employs low-pressure processing to achieve self-limiting oxidation of substrates, yielding ultra-thin oxynitride layers. The substrates can also contain or lack an initial dielectric layer, and the processing can be performed in various types of process chambers.
Career Highlights
Throughout his career, Michael Toeller has worked with prominent companies in the technology sector. He has been associated with Tokyo Electron Limited and IBM, where he has contributed to advancements in semiconductor manufacturing processes.
Collaborations
Toeller has collaborated with notable professionals in his field, including David L O'Meara and Cory Wajda. These collaborations have likely enriched his work and contributed to the development of innovative technologies.
Conclusion
Michael Toeller's contributions to the field of ultra-thin oxide and oxynitride layer technologies demonstrate his innovative spirit and expertise. His patents reflect a commitment to advancing semiconductor technology, making him a significant figure in the industry.