Location History:
- McKinney, TX (US) (2002)
- Dallas, TX (US) (2003)
Company Filing History:
Years Active: 2002-2003
Title: Michael Thomas Tucker: Innovator in Semiconductor Technology
Introduction
Michael Thomas Tucker is a notable inventor based in Dallas, TX (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative methods for handling silicon wafers and enhancing the efficiency of semiconductor processes.
Latest Patents
One of Tucker's latest patents is a method of handling a silicon wafer. This recycling procedure is designed for 300 mm nitride dummy wafers that have a stabilization layer of silicon dioxide. The process involves selectively wet etching the deposited silicon nitride with respect to the silicon dioxide stabilization layer, preferably using hot phosphoric acid at 160°C. This method includes steps such as depositing a silicon dioxide layer on the wafer surface, performing a nitride deposition process, and etching the silicon nitride or silicon oxinitride layer selectively.
Another significant patent by Tucker is related to a plasma-enhanced chemical vapor deposition (CVD) method to fill a trench in a semiconductor substrate. In this CVD chamber, a trench in the substrate is filled with dielectric material from ions of the plasma. The ions are directed to move perpendicularly to the substrate surface by employing a pulsed unidirectional voltage and a circular magnetic field.
Career Highlights
Throughout his career, Michael Thomas Tucker has demonstrated a commitment to advancing semiconductor technology. His innovative approaches have contributed to more efficient manufacturing processes in the industry.
Collaborations
Tucker has worked alongside talented individuals such as Terry Alan Breeden and Stefan Ottow, further enhancing the collaborative spirit in the field of semiconductor research.
Conclusion
Michael Thomas Tucker's contributions to semiconductor technology through his patents reflect his innovative spirit and dedication to improving industry practices. His work continues to influence the field and inspire future advancements.