Company Filing History:
Years Active: 2002
Title: Michael Sandler - Innovator in Wafer Processing Technology
Introduction
Michael Sandler is a notable inventor based in Migdal Haemek, Israel. He has made significant contributions to the field of semiconductor manufacturing, particularly in wafer processing technology. His innovative approach has led to the development of a unique method for enhancing the quality of silicon deposition on wafers.
Latest Patents
Sandler holds a patent for a method and apparatus for selectively depositing hemispherical grained silicon on the surface of a wafer in a process chamber. The patent describes a process where the chamber is evacuated to maintain a partial pressure of water vapor below 10 torr, utilizing a turbomolecular pump and a water vapor pump in cooperation. A process gas mixture containing silicon is introduced into the chamber, where the wafer's surface is seeded with silicon nuclei. The wafer is then annealed to convert the silicon to hemispherical grained silicon (HSG). This innovative technique enhances the efficiency and quality of silicon deposition.
Career Highlights
Michael Sandler is currently employed at Streag Cvd Systems Ltd, where he continues to advance his research and development efforts in semiconductor technology. His work has been instrumental in improving wafer processing techniques, which are critical for the production of high-performance electronic devices.
Collaborations
Sandler collaborates with talented professionals in his field, including Arie Harnik and Itai Bransky. Their combined expertise contributes to the innovative projects at Streag Cvd Systems Ltd.
Conclusion
Michael Sandler's contributions to wafer processing technology exemplify the spirit of innovation in the semiconductor industry. His patented methods are paving the way for advancements in silicon deposition, which are essential for the future of electronics.