Company Filing History:
Years Active: 2005
Title: The Innovative Mind of Michael R. Scheinfein
Introduction
Michael R. Scheinfein, an accomplished inventor based in West Vancouver, Canada, has made significant contributions to the field of ion beam technology. With a focus on enhancing precision in material processing, his innovative ideas and inventions continue to influence the direction of research and development in this area.
Latest Patents
Scheinfein holds a noteworthy patent titled "Focused Ion Beam System with Coaxial Scanning Electron Microscope." This patent introduces a system that integrates a co-axial focused ion beam with an electron beam. The combination allows for enhanced accuracy in processing with the focused ion beam (FIB) by utilizing images formed by the electron beam. The patent details various embodiments, including a deflector for directing the electron beam onto the ion beam's axis and improving the collection of secondary particles toward a detector. Furthermore, the patent discusses a positively biased final electrostatic lens that enables simultaneous or alternating operations of the FIB and scanning electron microscope (SEM) using a shared voltage. Notably, the system also allows for variability in the landing energy of electrons without altering the working distance.
Career Highlights
Michael R. Scheinfein's career is marked by his association with the FEI Company, where he collaborates with experts in the field. His expertise and innovative spirit have significantly contributed to the advancement of imaging and material processing technologies.
Collaborations
Throughout his career, Scheinfein has worked alongside talented colleagues, including Robert L. Gerlach and Mark Utlaut. These collaborations have enhanced the development of cutting-edge technologies that push the boundaries of traditional ion beam applications.
Conclusion
In summary, Michael R. Scheinfein's contributions to the field of focused ion beam systems signify his dedication to innovation and excellence. His patent and collaborative efforts with esteemed professionals reaffirm his position as a key player in advancing technology that enhances precision in material processing and imaging. His work undoubtedly serves as an inspiration for future inventors and researchers in the field.